Continuous measurement of surface potential variations during oxygen adsorption on the (100), (110) and (111) faces of niobium using mirror electron microscope
- 1 February 1977
- journal article
- Published by Elsevier in Surface Science
- Vol. 62 (2) , 589-609
- https://doi.org/10.1016/0039-6028(77)90103-0
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
- Investigation of surface reactions by the static method of secondary ion mass spectrometry: III. The oxidation of vanadium, niobium and tantalum in the monolayer rangeSurface Science, 1973
- The interaction of oxygen and nitrogen with the niobium (100) surfaceSurface Science, 1973
- The interaction of oxygen and nitrogen with the niobium (100) surface: I. MorphologySurface Science, 1973
- A kinetic study of the initial oxidation of a Ta(110) surface using oxygen kα X-ray emissionSurface Science, 1972
- Contribution à l'étude de l'oxydation du niobiumRevue de Physique Appliquée, 1970
- Contact-potential measurements of the adsorption of Cs, O2 and H2 on (110) TaSurface Science, 1967
- Adsorption on Niobium (110), Tantalum (110), and Vanadium (110) SurfacesThe Journal of Chemical Physics, 1967
- Adsorption, Absorption, and Degassing in the Oxygen-Niobium System at Very Low PressureJournal of the Electrochemical Society, 1967
- Low-Pressure Oxidation of Niobium at 1200°–1700°CJournal of the Electrochemical Society, 1965
- Low-energy electron diffraction and photoelectric study of (110) tantalum as a function of ion bombardment and heat treatmentSurface Science, 1964