Ion implantation of Ti into Fe in the presence of residual and backfilled gases
- 15 October 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 28 (3) , 336-343
- https://doi.org/10.1016/0168-583x(87)90173-x
Abstract
No abstract availableKeywords
This publication has 27 references indexed in Scilit:
- In situ auger electron spectroscopy applied to the study of chemisorption and diffusion during reactive implantation of titanium into ironApplied Surface Science, 1986
- Oxygen coverage dependent emission of sputtered neutrals and secondary ionsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986
- Oxygen exposure effect on sputtering yield and angular distribution for light-ion irradiation of polycrystalline molybdenumNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986
- Sputtering of metal targets under increased oxygen partial pressureNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1986
- In Situ proton-induced X-ray emission and auger electron spectroscopy study of titanium and niobium implantation of iron filmsMaterials Science and Engineering, 1985
- In situ auger analysis of surface composition during high fluence ion implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Compositions of metals implanted to very high fluencesVacuum, 1984
- Absorption of carbon from residual gases during Ti implantation of alloysApplied Physics Letters, 1983
- Ion implantation and sputtering in the presence of reactive gases: Bombardment-induced incorporation of oxygen and related phenomenaJournal of Applied Physics, 1981
- Comparison of xenon retention in ion implanted silicon dioxide and oxygen-doped siliconNuclear Instruments and Methods, 1978