Removal of NF/sub 3/ from semiconductor-process flue gases by tandem packed-bed plasma and adsorbent hybrid systems
- 1 January 2000
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Industry Applications
- Vol. 36 (5) , 1251-1259
- https://doi.org/10.1109/28.871272
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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