Effect of ion and atom masses on the crystallographic orientation of nitride films prepared by ion-beam-assisted deposition
- 31 August 1994
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 66 (1-3) , 313-317
- https://doi.org/10.1016/0257-8972(94)90020-5
Abstract
No abstract availableKeywords
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