Ion bombardment during thin film deposition and its influence on mechanical and chemical surface properties
- 1 July 1991
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 59-60, 173-181
- https://doi.org/10.1016/0168-583x(91)95201-n
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Modification of mechanical and chemical properties of thin films by ion bombardmentSurface and Coatings Technology, 1990
- Modification of chemical surface properties by ion beam assisted depositionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1990
- Ion-beam-assisted coatings for corrosion protection studiesMaterials Science and Engineering: A, 1989
- Fundamentals of ion-beam-assisted deposition: Technique and film propertiesMaterials Science and Engineering: A, 1989
- Thirty-eight-centimeter ion sourceNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- Ion beam assisted deposition for metal finishingNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- Low temperature growth of A1n and Al2O3 films by the simultaneous use of a microwave ion source and an ionized cluster beam systemThin Solid Films, 1988
- Property modification and synthesis by low energy particle bombardment concurrent with film growthNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Modification of thin film properties by ion bombardment during depositionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- A new machine for film formation by ion and vapour depositionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985