Low temperature growth of A1n and Al2O3 films by the simultaneous use of a microwave ion source and an ionized cluster beam system
- 1 February 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 157 (1) , 143-158
- https://doi.org/10.1016/0040-6090(88)90355-0
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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