Epitaxial growth of TiO2 films in a hydroxyl-free atomic layer deposition process
- 26 November 2001
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 235 (1-4) , 293-299
- https://doi.org/10.1016/s0022-0248(01)01804-8
Abstract
No abstract availableKeywords
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