Magnetic Penetration Depths and Normal-State Resistivities of Epitaxial and Polycrystalline NbCxN1-x Films
- 1 March 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (3A) , L239
- https://doi.org/10.1143/jjap.31.l239
Abstract
We have studied the magnetic penetration depth λ and the normal-state resistivity ρ of epitaxial and polycrystalline NbC x N1-x films as a function of film thickness t and sputtering gas pressure P during the deposition of the films. It was found that λ(∼200 nm) and ρ(∼50 µΩ·cm) of epitaxial films are almost independent of P and t, while λ(>300 nm) and ρ(>110 µΩ·cm) of polycrystalline films increase considerably with increasing P(>2 Pa) or decreasing t(<80 nm). The pressure and thickness dependence of λ and ρ of polycrystalline films can be explained by a model of Josephson coupling between grains.Keywords
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