Some effects of strain and temperature on the resistance of oxygen ion implanted titanium thin films
- 1 May 1972
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 10 (2) , 205-215
- https://doi.org/10.1016/0040-6090(72)90188-5
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Conduction in metal oxide thin films formed by oxygen ion implantationThin Solid Films, 1972
- Effect of ion bombardment on the adhesion of aluminium films on glassThin Solid Films, 1969
- Effect of Structure on the Piezoresistive Properties of Thin Metal FilmsJournal of Vacuum Science and Technology, 1969
- Electrical Resistance-Strain Characteristics of Thin Evaporated Metal FilmsJournal of Applied Physics, 1963