Photoresist Stripping Using a Remote Plasma: Chemical and Transport Effects
- 1 January 1987
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- High Rate Photoresist Stripping in an Oxygen AfterglowJournal of the Electrochemical Society, 1986
- Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1986
- Oxidative Removal of Photoresist by Oxygen/Freon® 116 Discharge ProductsJournal of the Electrochemical Society, 1984