Detailed in-situ monitoring of film growth: application to TiSi2 chemical vapor deposition
- 1 December 1993
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 134 (3-4) , 377-385
- https://doi.org/10.1016/0022-0248(93)90148-p
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
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