On the Decomposition of Silane in Plasma Deposition Reactors
Open Access
- 1 April 1986
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 14 (2) , 165-172
- https://doi.org/10.1109/tps.1986.4316519
Abstract
In a low-pressure discharge, plasma-enhanced decomposition of silane proceeds by various channels including electron-impact, ion- and radical-induced, and heterogeneous reactions. The results of several experiments are presented to clarify the relative importance of the processes. The conclusions of these studies and associated analysis are that the dominant processes are strongly influenced by the gas residence time, the power density input, and the electronegative characteristics of the silane discharge.Keywords
This publication has 16 references indexed in Scilit:
- Ion chemistry in silane dc dischargesJournal of Applied Physics, 1985
- Relation between the RF discharge parameters and plasma etch rates, selectivity, and anisotropyJournal of Vacuum Science & Technology A, 1984
- Positive and negative ions in silane and disilane multipole dischargesInternational Journal of Mass Spectrometry and Ion Processes, 1984
- Sensitive, Nonintrusive,In-SituMeasurement of Temporally and Spatially Resolved Plasma Electric FieldsPhysical Review Letters, 1984
- Silane pyrolysisChemical Physics Letters, 1984
- Electron kinetics of silane dischargesApplied Physics Letters, 1983
- Emission cross sections from fragments produced by electron impact on silaneChemical Physics, 1982
- Substitutional doping of amorphous siliconSolid State Communications, 1975
- Electron impact study of ionization and dissociation of monosilane and disilaneThe Journal of Physical Chemistry, 1969
- The far ultraviolet spectra of methylsilanesChemical Physics Letters, 1968