Why is coordination chemistry stretching the limits of micro-electronics technology?
- 1 December 1998
- journal article
- Published by Elsevier in Coordination Chemistry Reviews
- Vol. 178-180, 1785-1809
- https://doi.org/10.1016/s0010-8545(98)00087-3
Abstract
No abstract availableKeywords
This publication has 46 references indexed in Scilit:
- A New Liquid Precursor with Improved Thermal Stability for Chemical Vapor Deposition of CopperJournal of the Electrochemical Society, 1998
- Copper CVD precursors and processes for advanced metallization: Invited lectureMicroelectronic Engineering, 1997
- CVD process for copper interconnectionMicroelectronic Engineering, 1997
- Selective metallization of silica surfaces by copper CVD using a chemical affinity pattern created by gas phase silylation and UV exposureMicroelectronic Engineering, 1997
- Microscopic ellipsometry: imaging monolayer on arbitrary reflecting supportsThin Solid Films, 1996
- Formation and Structure of Self-Assembled MonolayersChemical Reviews, 1996
- Synthesis and Characterization of a Bis(μ-β-diketonato)bis((1,2,5,6-η)-1,5-dimethyl-1,5- cyclooctadiene)disilver Complex. An Intermediate in the Synthesis of an Isomerically Pure (β-Diketonato)((1,2,5,6-η)-1,5-dimethyl-1,5-cyclooctadiene)copper(I) ComplexInorganic Chemistry, 1996
- Role of Surface Chemistry in Semiconductor Thin Film ProcessingChemical Reviews, 1996
- Selective Copper Chemical Vapor Deposition Using Pd-Activated Organosilane FilmsLangmuir, 1995
- Laser Chemical Vapor Deposition of Gold: The Effect of Organometallic StructureJournal of the Electrochemical Society, 1987