Low-Resistivity Highly Transparent Indium-Tin-Oxide Thin Films Prepared at Room Temperature by Synchrotron Radiation Ablation
- 1 December 1999
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 38 (12R) , 6846-6850
- https://doi.org/10.1143/jjap.38.6846
Abstract
High-transparency, low-electrical-resistivity indium-tin-oxide (ITO)thin films were prepared on quartz substrates using synchrotron radiation ablation at room temperature. The films had a low resistivity (ρ=1.3×10-4 Ω·cm) and high-transparency properties in the visible region (T = 83% at 550 nm). X-ray diffraction patterns indicate that the crystalline ITO film was obtained by room-temperature deposition.Keywords
This publication has 24 references indexed in Scilit:
- Deposition of Polyethylene Thin Films Using Synchrotron Radiation AblationJapanese Journal of Applied Physics, 1999
- Analysis of Pulsed Excimer Laser Ablation of PZT, Pb And Ti in an Oxygen Ambient Using Energy Dispersive Mass SpectrometryMRS Proceedings, 1996
- High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation ProcessJapanese Journal of Applied Physics, 1995
- Investigation of Optimal Photosensor in A-Si:H Liquid Crystal Light ValvesMRS Proceedings, 1992
- A New Type of Stable and Sensitive UV Detector Fabricated with Amorphous Silicon Based AlloysMRS Proceedings, 1988
- Influence of Unsymmetrical Electrode structure on a-Si Photodiode CharacteristicsMRS Proceedings, 1986
- Transparent conductive films of In2O3:Sn prepared by the pyrolysis methodThin Solid Films, 1982
- Understanding core–valence–valence Auger line shapesJournal of Vacuum Science and Technology, 1982
- Adsorbate Core Ionization as Primary Process in Electron-and Photon-Stimulated Desorption from Metal SurfacesPhysical Review Letters, 1979
- Sputtered Cadmium Oxide and Indium Oxide/Tin Oxide Films as Transparent Electrodes to Cadmium SulfideJournal of the Electrochemical Society, 1972