Abstract
Luminescent Si0.8Ge0.2/Si single quantum well structures with abrupt interfaces were successfully grown by segregant assisted growth (SAG) using Sb adlayer. The emission energy shifted to the lower side compared to the sample grown without Sb adlayer due to the suppression of the surface segregation of Ge atoms. Improved abruptness of interfaces was confirmed by sputter depth profile measurement, where no segregation edge was seen in the sample grown by SAG technique. Light emitting pin diode structure can be fabricated by utilizing the incorporation of Sb during SAG.