As2-ambient activation and alloyed-ohmic-contact studies of Si+-ion-implanted Al0.3Ga0.7As/GaAs modulation-doped structures
- 1 February 1986
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 29 (2) , 181-187
- https://doi.org/10.1016/0038-1101(86)90037-7
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- The olympus fortran generatorComputer Physics Communications, 1984
- Low resistance alloyed ohmic contacts to Al 0.48 In 0.52 As/ n + -Ga 0.47 In 0.53 AsElectronics Letters, 1984
- The use of substrate annealing as a gettering technique prior to molecular beam epitaxial growthJournal of Vacuum Science & Technology B, 1984
- High-speed logic at 300K with self-aligned submicrometer-gate GaAs MESFET'sIEEE Electron Device Letters, 1983
- Heat treatment of semi-insulating chromium-doped gallium arsenide substrates with converted surface removed prior to molecular beam expitaxial growthApplied Physics Letters, 1983
- Obtaining the specific contact resistance from transmission line model measurementsIEEE Electron Device Letters, 1982
- Models for contacts to planar devicesSolid-State Electronics, 1972