High coercive field and film stress for epitaxial monolayers of Fe on W(110)
- 1 January 1996
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 32 (5) , 4570-4572
- https://doi.org/10.1109/20.539082
Abstract
Elastic and magnetic properties of ultrathin iron films on tungsten (110) are investigated. In situ film stress measurements during growth show stress values of 25 GPa per deposited monolayer. Our experiments indicate that the tremendous film stress triggers the formation of a misfit dislocation network at a coverage of 1.5 monolayers. The effect of the film stress and its spatial variation on the magnetic behavior are discussed. We find a high coercivity of order 0.3 T for 1.5 monolayer thick films. A model is presented that explains the high coercivity in terms of strong domain wall pinning.Keywords
This publication has 10 references indexed in Scilit:
- Magnetic Frustration in Ultrathin Fe FilmsPhysical Review Letters, 1995
- A simple technique to measure stress in ultrathin films during growthReview of Scientific Instruments, 1995
- Submonolayer Magnetism of Fe(110) on W(110): Finite Width Scaling of Stripes and Percolation between IslandsPhysical Review Letters, 1994
- Magnetic anisotropies of Fe(110) interfacesJournal of Magnetism and Magnetic Materials, 1994
- Giant energy product in nanostructured two-phase magnetsPhysical Review B, 1993
- Adsorbate-induced surface stress: sulfur, oxygen and carbon on Ni(100)Surface Science, 1992
- SMOKEJournal of Magnetism and Magnetic Materials, 1991
- Low energy dislocation structures in epitaxyMaterials Science and Engineering, 1986
- Periodic lattice distortions in epitaxial films of Fe(110) on W(110)Surface Science, 1982
- Spontane Magnetisierung und Curie-PunktPublished by Springer Nature ,1962