X-ray determination of the residual stresses in thin aluminum films deposited on silicon substrates
- 31 August 1989
- journal article
- Published by Elsevier in Scripta Metallurgica
- Vol. 23 (8) , 1449-1453
- https://doi.org/10.1016/0036-9748(89)90075-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- X-Ray Diffraction Analysis of Strains and Stresses in Thin FilmsPublished by Elsevier ,1988
- Measurement and Interpretation of stress in aluminum-based metallization as a function of thermal historyIEEE Transactions on Electron Devices, 1987
- Plastic properties of thin films on substrates as measured by submicron indentation hardness and substrate curvature techniquesJournal of Materials Research, 1986