Silicon nitride films deposited from SiH2Cl2NH3 by low pressure chemical vapor deposition: kinetics, thermodynamics, composition and structure
- 6 September 2002
- journal article
- Published by Elsevier
- Vol. 213 (2) , 182-191
- https://doi.org/10.1016/0040-6090(92)90281-f
Abstract
No abstract availableKeywords
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