Correlation between oxidation resistance and crystallinity of Ti–Al as a barrier layer for high-density memories
- 1 August 2000
- journal article
- Published by Elsevier in Acta Materialia
- Vol. 48 (13) , 3387-3394
- https://doi.org/10.1016/s1359-6454(00)00148-8
Abstract
No abstract availableKeywords
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