X-ray photoelectron spectroscopy characteristics of the W/TiN/Si and W/TiN/SiO2/Si structures
- 2 August 1993
- journal article
- Published by Elsevier in Journal of Electron Spectroscopy and Related Phenomena
- Vol. 63 (2) , 145-153
- https://doi.org/10.1016/0368-2048(93)80045-n
Abstract
No abstract availableKeywords
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