An X-ray photoelectron spectroscopy study of the surface layers between diamond crystallites and silicon substrate deposited by microwave-plasma-assisted chemical vapour deposition
- 31 March 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (2-4) , 558-561
- https://doi.org/10.1016/0925-9635(93)90120-q
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Microwave plasma chemical vapour deposition of high purity diamond filmsDiamond and Related Materials, 1993
- Textured diamond growth on (100) β-SiC via microwave plasma chemical vapor depositionApplied Physics Letters, 1992
- Transmission electron microscopy study of chemical-vapor-deposited diamond by a side-view methodApplied Physics Letters, 1992
- Effects of electric field on the growth of diamond by microwave plasma CVDVacuum, 1990
- Characterization of Diamond Particles and Films Formed by Plasma-Assisted Chemical Vapour Deposition Using High-Voltage Electron MicroscopyJapanese Journal of Applied Physics, 1987