Intrinsic and Defect-Induced Surface States of Cleaved GaAs(110)
- 25 October 1976
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 37 (17) , 1158-1161
- https://doi.org/10.1103/physrevlett.37.1158
Abstract
Photoemission-yield-spectroscopy measurements are reported for a set of cleaved -GaAs(110) surfaces, clean or gradually oxygen covered. Depending on the cleavage, the Fermi level at the clean surface is observed at the bulk position or toward midgap. For the first time, the existence of surface states in the gap, close to the conduction band is directly demonstrated when the density of the defect-induced surface states found near the valence-band maximum is small.
This publication has 10 references indexed in Scilit:
- Semiconductor Surface Reconstruction: The Rippled Geometry of GaAs(110)Physical Review Letters, 1976
- Photoemission study of surface states of the (110) GaAs surfacePhysical Review B, 1976
- Work function variations of gallium arsenide cleaved single crystalsSurface Science, 1975
- Photoemission Partial Yield Measurements of Unoccupied Intrinsic Surface States for Ge(111) and GaAs(110)Physical Review Letters, 1974
- Adsorption of oxygen on clean cleaved (110) gallium-arsenide surfacesPhysical Review B, 1974
- Surface state band on GaAs (110) faceApplied Physics Letters, 1974
- Electron Energy-Loss Spectroscopy of GaAs and Ge SurfacesPhysical Review Letters, 1974
- Photoemission Densities of Intrinsic Surface States for Si, Ge, and GaAsPhysical Review Letters, 1972
- Electronic properties of clean cleaved {110} GaAs surfacesSurface Science, 1971
- Influence of volume dope on Fermi level position at gallium arsenide surfacesSurface Science, 1967