Lithography with high depth of focus by an ion projection system
- 1 September 1992
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in Journal of Microelectromechanical Systems
- Vol. 1 (3) , 116-120
- https://doi.org/10.1109/84.186390
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Fabrication of 3.5 GHz surface acoustic wave filters by ion projection lithographyMicroelectronic Engineering, 1992
- Electron-beam cell projection lithography: A new high-throughput electron-beam direct-writing technology using a specially tailored Si apertureJournal of Vacuum Science & Technology B, 1990
- Open silicon stencil masks for demagnifying ion projectionMicroelectronic Engineering, 1987
- Ion projection lithography for sub-micron modification of materialsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Ion projection lithography in (in)organic resist layersMicroelectronic Engineering, 1986