Fabrication and electrical characterization of planar resonant tunneling devices incorporating InAs self-assembled quantum dots
- 16 August 1999
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 75 (8) , 1167-1169
- https://doi.org/10.1063/1.124631
Abstract
Planar-type quantum-dot devices have been fabricated and characterized. Aluminum metal electrodes with interelectrode spacing of 30 nm have been deposited on an InAs self-assembled quantum-dot wafer to form the quantum-dot devices. The current–voltage characteristics measured from the devices, in which a single quantum dot is placed in between the electrodes, exhibit negative differential resistance effects at the temperature above 77 K. They are interpreted as due to three-dimensional–zero-dimensional resonant tunneling through the InAs self-assembled quantum dot.Keywords
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