Reactions of Co/Mo bilayers and amorphous Co50Mo50 alloy films with silicon substrates
- 1 August 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 162, 199-207
- https://doi.org/10.1016/0040-6090(88)90207-6
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Interactions of amorphous alloys with Si substrates and Al overlayersJournal of Applied Physics, 1986
- Reaction of amorphous Ni-W and Ni-N-W films with substrate siliconJournal of Applied Physics, 1984
- Phase separation and layer sequence reversal during silicide formation with Ni-Cr alloys and Ni-Cr bilayersJournal of Applied Physics, 1984
- Thermal stability data of amorphous binary alloysBulletin of Alloy Phase Diagrams, 1981
- Phase separation in alloy-Si interactionApplied Physics Letters, 1980
- Contact reaction between Si and Pd-W alloy filmsJournal of Applied Physics, 1979
- Silicide formation with Pd-V alloys and bilayersJournal of Applied Physics, 1979
- Interactions in the Co/Si thin-film system. II. Diffusion-marker experimentsJournal of Applied Physics, 1978
- Interactions in the Co/Si thin-film system. I. KineticsJournal of Applied Physics, 1978
- Tungsten as a marker in thin-film diffusion studiesApplied Physics Letters, 1976