Reduced order model for the CVD of epitaxial silicon from silane and chlorosilanes
- 1 August 2001
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 230 (1-2) , 247-257
- https://doi.org/10.1016/s0022-0248(01)01349-5
Abstract
No abstract availableKeywords
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