Behavior of negative ions and aggregation process of particle growth in silane plasma
- 28 September 1998
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 73 (13) , 1799-1801
- https://doi.org/10.1063/1.122286
Abstract
Particle formation processes in silane plasma have been studied by means of ab initio molecular orbital method and the Derjaguin–Landau–Verway–Overbeek (DLVO) theory. The results from a quantitative comparison between the Si–H bonding energy of negative species and that of neutral ones suggested the presence of the polymerization pathways via negative species. The DLVO theory has been applied to calculate the interaction potential energy between the charged particles. It was found that the heterogeneous aggregation accelerates the particle growth.Keywords
This publication has 22 references indexed in Scilit:
- Detection of particles in rf silane plasmas using photoemission methodJournal of Applied Physics, 1996
- Anionic clusters in dusty hydrocarbon and silane plasmasJournal of Vacuum Science & Technology A, 1996
- Growth processes of particles in high frequency silane plasmasJournal of Vacuum Science & Technology A, 1996
- Simultaneous in situ measurements of properties of particulates in rf silane plasmas using a polarization-sensitive laser-light-scattering methodJournal of Applied Physics, 1996
- Diagnostics of particle genesis and growth in RF silane plasmas by ion mass spectrometry and light scatteringPlasma Sources Science and Technology, 1994
- Possible routes for cluster growth and particle formation in RF silane dischargesPlasma Sources Science and Technology, 1994
- Formation processes of particulates in helium-diluted silane RF plasmasIEEE Transactions on Plasma Science, 1994
- Time-resolved measurements of highly polymerized negative ions in radio frequency silane plasma deposition experimentsJournal of Applied Physics, 1994
- In situ plasma contamination measurements by HeNe laser light scattering: A case studyJournal of Vacuum Science & Technology A, 1990
- Sequential clustering reactions of Si+ with silane: A theoretical study of the reaction mechanismsThe Journal of Chemical Physics, 1988