Channeling contrast analysis of local damage distributions induced by maskless implantation
- 1 April 1991
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 55 (1-4) , 866-869
- https://doi.org/10.1016/0168-583x(91)96295-v
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- A microbeam line for medium-energy ion beamsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1990
- A 500 keV ion beam accelerator for microbeam formationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1990
- Quick Focus Adjustment for Quadrupole Lens System to Form High-Energy Ion MicrobeamJapanese Journal of Applied Physics, 1989
- muprobe using focused 1.5 MeV helium ion and proton beamsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1988
- Specimen damage by nuclear microbeams and its avoidanceNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1988
- Ion microbeam applications in semiconductorsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1988
- 200 kV Mass-Separated Fine Focused Ion Beam ApparatusJapanese Journal of Applied Physics, 1985
- Channeling contrast microscopy: Application to semiconductor structuresApplied Physics Letters, 1983