Variation in the fixed charge density of SiOx/ZrO2 gate dielectric stacks during postdeposition oxidation

The effect of postdeposition oxidation of ${\mathrm{SiO}}_x/{\mathrm{ZrO}}_{\mathrm{2}}$ gate dielectric stacks at different temperatures (500–700 °C) on the density of fixed charge and interface states is investigated. It is shown that with increasing oxidation temperature the density of negative fixed charge is reduced, but the density of interface states increases. The net positive charge observed after oxidation at $\text{T>500\hspace{0.05em}°}\mathrm{C}$ resembles the charge generated at the ${\mathrm{Si/SiO}}_{\mathrm{2}}$ interface by hydrogen in the same temperatures range. This association is supported by the resistance of both types of charge against molecular hydrogen anneal but their fast removal in the presence of atomic hydrogen at 400 °C. Therefore, we propose that the observed oxidation-induced positive charge in the ${\mathrm{SiO}}_x/{\mathrm{ZrO}}_{\mathrm{2}}$ gate stack may be related to overcoordinated oxygen centers induced by hydrogen.