An excimer-laser-based nanosecond thermal diffusion technique for ultra-shallow pn junction fabrication
- 31 March 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 20 (1-2) , 107-130
- https://doi.org/10.1016/0167-9317(93)90210-v
Abstract
No abstract availableKeywords
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