The effect of irradiation-induced lattice strain on the width of local mode absorption lines in silicon

Abstract
Samples of silicon doped with oxygen alone, or with oxygen and carbon have been irradiated with fast neutrons up to a maximum dose of 1020 cm-2. It is shown that there is a progressive decrease in the resolution of the fine structure of the 9 mu m band due to oxygen, and a corresponding increase in the width of the band at 12 mu m due to (O-V)0 centres. These measurements have also been made on samples containing group III and/or group V impurities; the degree of disorder in these samples is greater showing that there are important impurity effects. These results are compared with the structure of the 9 mu m band found in silicon after implantation with 400 keV oxygen ions.

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