Optimized frequency characteristics of Si/SiGe heterojunction and conventional bipolar transistors
- 28 February 1990
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 33 (2) , 199-204
- https://doi.org/10.1016/0038-1101(90)90157-a
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- n-Si/p-Si1−xGex/n-Si double-heterojunction bipolar transistorsApplied Physics Letters, 1988
- High-frequency performance limitations of millimeter-wave heterojunction bipolar transistorsIEEE Transactions on Electron Devices, 1988
- GexSi1−x strained-layer heterostructure bipolar transistorsApplied Physics Letters, 1988
- Si/Ge0.3Si0.7/Si heterojunction bipolar transistor made with Si molecular beam epitaxyApplied Physics Letters, 1988
- beta -SiC/Si heterojunction bipolar transistors with high current gainIEEE Electron Device Letters, 1988
- Physics and applications of GexSi1-x/Si strained-layer heterostructuresIEEE Journal of Quantum Electronics, 1986
- A study of n+-SIPOS:p-Si heterojunction emittersIEEE Electron Device Letters, 1985
- Numerical simulation of hot-carrier transport in silicon bipolar transistorsIEEE Transactions on Electron Devices, 1983
- Temperature dependence of the band gap of siliconJournal of Applied Physics, 1974
- Stability and Power-Gain Invariants of Linear TwoportsIRE Transactions on Circuit Theory, 1962