Investigation of chemically vapour deposited tungsten and tungsten silicide as contacts to n+ and p+ silicon areas
- 1 February 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 185 (1) , 9-19
- https://doi.org/10.1016/0040-6090(90)90003-v
Abstract
No abstract availableKeywords
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