Electrical characterization of stressed and broken down SiO2 films at a nanometer scale using a conductive atomic force microscope
- 15 February 2002
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 91 (4) , 2071-2079
- https://doi.org/10.1063/1.1430542
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
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