Growth and characterization of strain compensated Si1−x−y epitaxial layers
- 1 November 1993
- journal article
- Published by Elsevier in Materials Letters
- Vol. 18 (1-2) , 57-60
- https://doi.org/10.1016/0167-577x(93)90056-4
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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