Monte Carlo simulations of ion-assisted selectivedeposition
- 31 December 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 193-194, 13-17
- https://doi.org/10.1016/s0040-6090(05)80006-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Sputtering studies with the Monte Carlo Program TRIM.SPApplied Physics A, 1984
- Selective Low Pressure Chemical Vapor Deposition of TungstenJournal of the Electrochemical Society, 1984
- A Monte Carlo computer program for the transport of energetic ions in amorphous targetsNuclear Instruments and Methods, 1980