Microwave performance of optically fabricated T-gate thin film silicon-on-sapphire based MOSFET's
- 1 June 1995
- journal article
- research article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 16 (6) , 289-292
- https://doi.org/10.1109/55.790738
Abstract
Microwave characteristics of n and p-MOS transistors fabricated in thin film (50 and 100 nm) silicon-on-sapphire with T-gate lengths drawn at 0.5 and 0.7 /spl mu/m are reported. The observed f/sub max/ was as high as 32 GHz for a n-MOS 0.7 /spl mu/m gate length device. Minimum noise figure values of 1.4, 1.8, and 2.1 dB at 2, 8, and 12 GHz respectively were obtained in a 100 nm thick n-channel device. N-channel device results were comparable in the 50 and 100 nm films. For the p-channel FETs, the thinner, more highly stressed films gave significantly better results than the thicker p-channel films. At 2 GHz, p-FET noise figures as low as 1.7 dB were found. These results are, to the authors' knowledge, the lowest reported noise figures for either the p- or n-channel devices of any silicon based FET technology. Thinner films showed better voltage gain (g/sub m//g/sub out/) than the thicker films.Keywords
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