Sputtering ion source with simultaneous use of microwave and Penning-ionization-gauge discharge
- 1 January 1990
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 61 (1) , 598-600
- https://doi.org/10.1063/1.1141929
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Characteristics of Penning ionization gauge type compact microwave metal ion sourceJournal of Vacuum Science & Technology A, 1988
- Low-Energy Double-Ion-Beam Deposition SystemJapanese Journal of Applied Physics, 1988
- PIG-Type Compact Microwave Metal Ion SourceJapanese Journal of Applied Physics, 1987
- Possible Emittance Increase through Filamentation Due to Space Charge in Continuous BeamsIEEE Transactions on Nuclear Science, 1971