Chemical Stability of HBF4-Treated (100)Si Surfaces
- 1 April 1995
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 34 (4R) , 1723-1727
- https://doi.org/10.1143/jjap.34.1723
Abstract
Si(100) surfaces were modified by means of enhanced RCA procedure with “ HBF4-last” and “HF-last”. Nulling ellipsometric (NE) and secondary ion mass spectrometric (SIMS) measurements revealed that HBF4-treated Si surface is more strongly passivated by hydrogen and fluorine than HF-treated one: the oxidation rate of the HBF4-treated Si surfaces in air was found to be lower than that of the HF-treate surface. Scanning tunneling microscope (STM) images of HBF4-cleaned surface after 18 h storage in air were quite stable during observation, scanning could be easily performed over a wide area on every plot we chose.Keywords
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