High-performance InGaAsP/InP buried-heterostructure lasers and arrays defined by ion-beam-assisted etching

Abstract
Ion-beam-assisted etching has been used to fabricate mass-transported InGaAsP/InP buried- heterostructure lasers. These lasers have a novel, deeply etched rectangular mesa that results in reduced current leakage. Both single-stripe lasers and Y-junction-coupled multiple-stripe laser arrays have been demonstrated. The single-stripe lasers have 12 mA cw threshold currents, differential quantum efficiencies of 32%–34% per facet, and smooth single-lobe far-field patterns. The multiple-stripe arrays lase in-phase with strong phase coherence.