High vacuum chemical vapor deposition of cubic SiC thin films on Si(001) substrates using single source precursor
- 31 January 2001
- journal article
- Published by Elsevier
- Vol. 131 (1-3) , 147-152
- https://doi.org/10.1016/s0257-8972(00)00820-3
Abstract
No abstract availableKeywords
Funding Information
- Korea Science and Engineering Foundation (1999-2-301-002-3)
- Ministry of Education
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