Depth profile and thermal annealing behavior of Bi implanted into an Al/Ti bilayer structure
- 15 July 1985
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 58 (2) , 659-662
- https://doi.org/10.1063/1.336178
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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