a-SiCx:H films deposited by plasma-enhanced chemical vapor deposition at low temperature used for moisture and corrosion resistant applications
- 1 September 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 352 (1-2) , 97-101
- https://doi.org/10.1016/s0040-6090(99)00363-6
Abstract
No abstract availableKeywords
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