The initial stage of nucleation and growth of Al on H/Si(100)-1×1 by dimethylaluminum hydride vapor deposition
- 10 March 1999
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 141 (3-4) , 228-236
- https://doi.org/10.1016/s0169-4332(98)00509-1
Abstract
No abstract availableKeywords
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