Contribution of free electrons to Al CVD on a Si surface by photo-excitation
- 1 May 1994
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 79-80, 237-243
- https://doi.org/10.1016/0169-4332(94)90416-2
Abstract
No abstract availableFunding Information
- Ministry of Education, Culture, Sports, Science and Technology
This publication has 7 references indexed in Scilit:
- Area-selective CVD of metalsThin Solid Films, 1993
- Selective aluminum chemical vapor depositionJournal of Vacuum Science & Technology A, 1992
- Complete planarization of via holes with aluminum by selective and nonselective chemical vapor depositionApplied Physics Letters, 1990
- Selective deposition of aluminum from selectively excited metalorganic source by the rf plasmaApplied Physics Letters, 1990
- Ideal hydrogen termination of the Si (111) surfaceApplied Physics Letters, 1990
- Laser direct writing of aluminum conductorsApplied Physics Letters, 1988
- Pyrolysis and Photolysis of TrimethylaluminumJapanese Journal of Applied Physics, 1986