Area-selective CVD of metals
- 1 May 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 228 (1-2) , 312-318
- https://doi.org/10.1016/0040-6090(93)90624-x
Abstract
No abstract availableFunding Information
- Ministry of Education, Culture, Sports, Science and Technology
This publication has 8 references indexed in Scilit:
- Selective aluminum chemical vapor depositionJournal of Vacuum Science & Technology A, 1992
- SAW Resonators Using Epitaxially Grown Al ElectrodesJapanese Journal of Applied Physics, 1991
- Complete planarization of via holes with aluminum by selective and nonselective chemical vapor depositionApplied Physics Letters, 1990
- Control of the chemical reactivity of a silicon single-crystal surface using the chemical modification techniqueJournal of Applied Physics, 1990
- Selective deposition of aluminum from selectively excited metalorganic source by the rf plasmaApplied Physics Letters, 1990
- Ideal hydrogen termination of the Si (111) surfaceApplied Physics Letters, 1990
- Development of Scanning µ-RHEED Microscopy for Imaging Polycrystal Grain Structure in LSIJapanese Journal of Applied Physics, 1989
- Correlated discrete transfer of single electrons in ultrasmall tunnel junctionsIBM Journal of Research and Development, 1988