Liquid-Nitrogen-Cooled Dry Etching of YBaCuO Thin Films
- 1 August 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (8A) , L1044-1046
- https://doi.org/10.1143/jjap.31.l1044
Abstract
A new dry etching method has been developed for patterning YBaCuO thin films with less damage, wherein samples are cooled by liquid nitrogen. It is found that the critical current density J c of films etched by this cooling method is significantly improved, more than one order of magnitude higher than that for the films etched at 5°C. Furthermore, it is found that this technique causes less damage to the surface of the YBaCuO films, compared to the etching at 5°C. This result suggests that the dry etching process with liquid nitrogen cooling is a promising method for the fabrication of high-T c superconducting electronic devices of small dimensions.Keywords
This publication has 12 references indexed in Scilit:
- Chemical plasma etching of Y-Ba-Cu-oxide thin filmsJournal of Applied Physics, 1991
- High-Tc Thin Film and Electronic DevicesPhysics Today, 1991
- Wet chemical etching of high-temperature superconducting Y-Ba-Cu-O films in ethylenediaminetetraacetic acidApplied Physics Letters, 1989
- Laser patterning and critical current measurements of submicrometer lines of Y-Ba-Cu-OApplied Physics Letters, 1989
- Effects of Ar Ion-Beam Etching on Gd-Ba-Cu-O Superconducting Thin FilmsJapanese Journal of Applied Physics, 1989
- Preparation, patterning, and properties of thin YBa2Cu3O7−δ filmsApplied Physics Letters, 1988
- Direct laser writing of superconducting patterns of Y1Ba2Cu3O7−δApplied Physics Letters, 1988
- Reactive ion beam etching of Y-Ba-Cu-O superconductorsApplied Physics Letters, 1988
- Nb/Al-oxide/Nb Tunnel Junctions for Josephson Integrated CircuitsJapanese Journal of Applied Physics, 1986
- Reactive Ion Beam Etching Using a Broad Beam ECR Ion SourceJapanese Journal of Applied Physics, 1982