High‐temperature operation of an AlGaN/GaN HFET on a Si substrate using a thin GaN film
- 24 November 2003
- journal article
- research article
- Published by Wiley in physica status solidi (c)
- No. 7,p. 2343-2346
- https://doi.org/10.1002/pssc.200303453
Abstract
No abstract availableKeywords
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