Metal doped fluorocarbon polymer films prepared by plasma polymerization using an RF planar magnetron target
- 1 July 1983
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 212 (1-3) , 497-503
- https://doi.org/10.1016/0167-5087(83)90735-4
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- Metal-containing fluoropolymer films produced by simultaneous plasma etching and polymerization: The series of perfluoroalkanes nF2n+2 (n = 1,2,3,4)Thin Solid Films, 1981
- Summary Abstract: Metal and salt cluster formation in polymer films produced in argon/C3F8 plasmasJournal of Vacuum Science and Technology, 1981
- Plasma polymerization of fluorocarbons in rf capacitively coupled diode systemJournal of Vacuum Science and Technology, 1981
- The construction of small planar magnetrons for sputtering useVacuum, 1981
- Metal-containing fluoropolymer films produced by simultaneous plasma etching and polymerization: Effects of hydrogen or oxygenJournal of Applied Physics, 1980
- A review of plasma process studiesSurface Technology, 1980
- Metal Containing Fluoropolymer Films Produced by Simultaneous Plasma Etching and PolymerizationPublished by American Chemical Society (ACS) ,1979
- Metal-containing plasma polymerized fluorocarbon films—their synthesis, structure, and polymerization mechanismJournal of Vacuum Science and Technology, 1979
- Incorporation of Metals into Fluoropolymer Films Synthesized by Plasma TechniquesJournal of Macromolecular Science: Part A - Chemistry, 1978
- The behaviour of perfluoropolyether and other vacuum fluids under ion and electron bombardmentNuclear Instruments and Methods, 1973